光子学报 ›› 2019, Vol. 48 ›› Issue (4): 423002-0423002.doi: 10.3788/gzxb20194804.0423002

• 光学器件 • 上一篇    下一篇

边缘形貌缺陷对条状光学天线响应特性的影响

张骞, 李春, 元光   

  1. 中国海洋大学 信息科学与工程学院, 山东 青岛 266100
  • 收稿日期:2018-10-23 出版日期:2019-04-25 发布日期:2019-01-24
  • 通讯作者: 元光(1967-),男,教授,博导,主要研究方向为纳米材料与人工微结构的光电特性、红外光谱检测技术.Email:yuanguang@ouc.edu.cn
  • 作者简介:张骞(1993-),男,硕士研究生,主要研究方向为光学天线的红外增强特性.Email:zhangqian_ouc@qq.com
  • 基金资助:

    国家自然科学基金(No.41476082),电波环境特性及模化技术重点实验室资助(No.201803001)

Influence of Edge Morphology Defect on Response Characteristics of Strip Optical Antenna

ZHANG Qian, LI Chun, YUAN Guang   

  1. College of Information Science and Engineering, Ocean University China, Qingdao, Shandong 266100, China
  • Received:2018-10-23 Online:2019-04-25 Published:2019-01-24
  • Contact: 2019-01-24
  • Supported by:

    The National Natural Science Foundation of China, (No. 41476082), Key Laboratory of Radio Wave Environment Characteristics and Modeling Technology(No.201803001)

摘要:

使用有限时域差分法,模拟计算了天线边缘的凹凸缺陷对硅基底上的条形天线的响应特性及电场分布的影响.计算结果表明:两种类型的缺陷都将改变缺陷附近的电场方向和电场强度,凸起缺陷可以使其附近的电场增强,而凹陷缺陷则相反,且缺陷越靠近天线末端,对电场的影响越强.缺陷大小和位置不同,对电场增强面积的影响不同.凹陷缺陷位于天线末端时,随着缺陷的增大,电场强度增强2倍的区域单调减小,增强4倍的区域面积单调增加.当缺陷为20nm时,电场强度增强2倍的区域面积降低约3%,增强4倍的区域面积增加约4%.与凹陷缺陷不同凸起缺陷没有简单单调性,缺陷位置不同,影响也有所区别,但是控制缺陷在10nm以内可以显著降低影响.该结果为光学天线加工的精度要求提供了理论依据.

关键词: 局域等离子体共振, 边缘缺陷, 光学天线, 条形天线, 时域有限差分法

Abstract:

The finite-time difference method is used to simulate the influence of the concave and convex defects on the edge of the antenna on the response characteristics and electric field distribution of the strip antenna on the silicon substrate.The calculation results show that both types of defects change the electric field direction and electric field strength near the defect.The convex defect can enhance the electric field in the vicinity,while the concave defect is opposite,and the closer to the end of the antenna,the stronger the effect of defects.Defects of different positions and sizes have different effects on the area of the electric field enhancement.When the concave-defect is located at the end of the antenna,as the size increases,the area where the electric field strength is increased by 2 times monotonously decreases,and the area where the electric field is enhanced by 4 times monotonously increases.When the defect is 20 nm,the area where the electric field strength is increased by 2 times is reduced by about 3%,and the area where the electric field is enhanced by 4 times is increased by about 4%.Different from the concave defect,the convex defect has no simple monotonicity,and the defect position is different,and the influence is also different.However,controlling defects within 10 nm can significantly reduce the impact.This result provides a theoretical basis for the accuracy requirements of optical antenna processing.

Key words: Local plasmon resonance, Finite difference time domain method, Optical antenna, Stick antenna, Edge defect

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