光子学报 ›› 2019, Vol. 48 ›› Issue (10): 1005001-1005001.doi: 10.3788/gzxb20194810.1005001

• 衍射与光栅 • 上一篇    下一篇

基于铋纳米颗粒的自由沉降法制作X射线吸收光栅

雷耀虎, 许桂雯, 李乔飞, WALI Faiz, 刘鑫, 李冀, 黄建衡   

  1. 深圳大学 物理与光电工程学院 光电子器件与系统(教育部/广东省)重点实验室, 广东 深圳 518060
  • 收稿日期:2019-06-11 出版日期:2019-10-25 发布日期:2019-07-16
  • 通讯作者: 黄建衡(1985-),男,讲师,博士,主要研究方向为X射线相衬成像.Email:xianhuangjianheng@163.com E-mail:xianhuangjianheng@163.com
  • 作者简介:雷耀虎(1984-),男,讲师,博士,主要研究方向为X射线相衬成像光栅制作技术.Email:leiyaohu@szu.edu.cn
  • 基金资助:

    国家自然科学基金(Nos.61227802,61405120,61605119,61571305,11674232),深圳市自然科学基础研究(No.JCYJ20170302142617703),深圳大学教师启动项目(Nos.2017017,2018041)

Fabrication of X-ray Absorption Gratings by Free Settling of Bismuth Nanoparticles

LEI Yao-hu, XU Gui-wen, LI Qiao-fei, WALI Faiz, LIU Xin, LI Ji, HUANG Jian-heng   

  1. Key Laboratory of Optoelectronic Devices and Systems of Ministry of Education and Guangdong Province, College of Physics and Optoelectronic Engineering, Shenzhen University, Shenzhen, Guangdong 518060, China
  • Received:2019-06-11 Online:2019-10-25 Published:2019-07-16
  • Contact: 2019-07-16 E-mail:xianhuangjianheng@163.com
  • Supported by:

    The National Natural Science Foundation (Nos. 61227802, 61405120, 61605119, 61571305, 11674232), Foundation of Shenzhen Science and Technology Bureau (No. JCYJ20170302142617703), Natural Science Foundation of SZU (Nos. 2017017, 2018041)

摘要:

利用深反应离子刻蚀技术或湿法腐蚀在硅上制作光栅结构,将与光栅浸润的液体作为载体携带铋纳米颗粒进入光栅结构内,形成致密排列,从而制作出X射线吸收光栅.致密地填充了周期为42 μm、刻蚀深度为150 μm的光栅结构,比较了其与微铸造法制作的铋块体吸收光栅的X射线吸收性能,并通过填充周期为24 μm和6 μm的光栅结构,研究了光栅周期与填充致密性之间的关系.扫描电镜测试结果显示自由沉降法可有效制作较大周期光栅,但对周期为6 μm光栅结构填充的致密性不佳。分析结果表明,对于小周期吸收光栅,需筛选所用填充颗粒,以保证颗粒粒径远小于光栅槽宽.基于纳米颗粒的自由沉降法可降低光栅制作成本及技术门槛,方便实现大面积吸收光栅的制作.

关键词: 铋纳米颗粒, 相位衬度, 吸收光栅, 刻蚀, 自由沉降, X射线成像

Abstract:

To fabricate X-ray absorption gratings, deep reactive ion etching and wet etching are used to fabricate grating structures on silicon wafers, and a liquid carrier, which is wet with the surface of grating structure, is used to bring the bismuth nanoparticles into grating structures in a dense arrangement. Then, a grating structure with the period of 42 μm and depth of 150 μm is filled. To show the performance of the fabricated absorption grating, a comparison with the bulk bismuth grating obtained by micro-casting method is provided. Moreover, the relationship between the grating period and the filling compactness through filling grating structures with periods of 24 μm and 6 μm is found. The scanning electron microscopy micrographs show the effectiveness of free settling method for the large-period grating structures. However, for the structures with 6 μm period, the filling compactness is not satisfied. The results illustrate that bismuth nanoparticles that their diameters are much less than the width of grating structures should be selected for the small-period absorption gratings. Furthermore, nanoparticles-based free settling method lowers grating cost and technique threshold, and allows the fabrication of large-area absorption gratings.

Key words: Bismuth nanoparticles, X-ray imaging, Free settling, Etching, Absorption gratings, Phase contrast

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