Acta Photonica Sinica ›› 2019, Vol. 48 ›› Issue (6): 623001-0623001.doi: 10.3788/gzxb20194806.0623001

• Optical Devices • Previous Articles     Next Articles

Process Research of Wedge Mode Size Converter

WANG Xiao1,2, SUN Tian-yu2, FANG Dan1, LIU Jun-cheng1,2, TANG Ji-long1, FANG Xuan1, WANG Deng-kui1, ZHANG Bao-shun2, WEI Zhi-peng1   

  1. 1. State Key Laboratory of High Power Semiconductor Laser, School of Science, Changchun University of Science and Technology, Changchun 130022, China;
    2. Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Sciences, Suzhou, Jiangsu 215123, China
  • Received:2019-01-14 Online:2019-06-25 Published:2019-04-09
  • Supported by:

    The National Natural Science Foundation of China(Nos.11674038,61674021,61574022,61704011)

Abstract:

The stepwise principle of the step projection lithography machine is used to control the exposure dose to prepare a wedge-shaped mode size converter.The effects of different exposure doses on the sidewall morphology and the best etching parameters were analyzed. The experimental results show that the optimum exposure time is 20 ms each time, the reflow temperature is 160℃ for 1 min. When the etching gas and the ratio are SF6:He=8:80, the sample obtained after etching has good morphology. The preparation method has the advantages of short manufacturing cycle and high precision, and has the advantages of high efficiency and low cost compared with the electron beam gray exposure method.

Key words: Mode size converter, Stepper exposure, Etching process, Wedge-shaped, Gray scale

CLC Number: